[en] Full text: In this work the adsorption properties of a ZrV-NEG (non evaporable getter) film have been investigated. NEG films are used as active pumping systems to achieve ultra-high vacuum conditions, especially in collider facilities. The main advantage of these films is that they can be activated already at rather low temperature of about 200 ^oC. The ZrV films investigated have been prepared by magnetron sputtering on stainless steel substrates. In particular we have studied the adsorption behavior of atomic hydrogen as function of activation temperature up to 800 ^oC. The surface composition has been characterized by Auger electron spectroscopy (AES), the hydrogen coverage and the sticking probability has been determined by quantitative thermal desorption spectroscopy (TDS). It has been shown that the main reason for the activation at about 200 ^oC is the decrease of the oxygen concentration on the surface by dissolution into the bulk. Nevertheless, adsorption of atomic hydrogen is still rather small in this case. Only an activation temperature of about 650 ^oC leads to a considerable increase of the adsorption behavior, leading to a sticking probability for atomic hydrogen of close to unity. However, the adsorption probability as well as the saturation coverage depend strongly on the surface temperature. The samples remain active for longer time at room temperature than at LN2 surface temperature, due to increased dissolution of hydrogen into the bulk. (author)