[en] Full text: The technology of surface modifying of practical-use materials by means of continuous and pulsed energy and particle beams has been intensely studied for more than 20 years. In some fields it is presently utilized on a wide scale in industry. Continuous or pulsed ion and plasma beams play a significant role among various approaches used in this area. The research carried by Department P-I X is centered around the use of its two ion implantation machines (ion implanters) of different kind and several world-wide unique sources of high-intensity plasma pulses, utilized jointly with Department P-V. The Department cooperates with Forschungszentrum Rossendorf (FZR, Dresden, Germany) in the field of ion-beam-based analytical techniques and the use of unique ion implantation facilities. The main objectives of the Department are: - a search for new ways of modifying surface properties of solid materials by means of continuous or pulsed ion and plasma beams and - implementation of ion implantation technique in national industries as a method of improving the lifetime of machine parts and tools utilized in industry. In 2003 these objectives were accomplished in many ways, particularly by research on: - phase transitions in steels irradiated with intense N and Ar plasma beams, - synthesis of superconducting MgB₂ using ion implantation and plasma pulses techniques, - kinetics of the high-temperature corrosion processes in implanted and unimplanted TiN layers, - high-current implantation of nitrogen as a method of producing AlN layers, - computer simulations of differential thermocouples in plasma pulse measurements in MW power range, - brazing of copper with AIN ceramics, surface-modified by ion implantation. The research was conducted in cooperation with Department P-V of IPJ, Institute of Nuclear Chemistry and Technology (Warsaw), Warsaw University of Technology, Institute of Technology of Materials for Electronics (Warsaw), Forschungszentrum Rossendorf FZR (Dresden, Germany), as well. as with some industrial companies. (author)