[en] Fluorinated amorphous carbon films (a-C:H:F) were grown from CF₄ and C₂H₂ mixtures, using a DC-plasma assisted chemical vapor deposition (DC-PACVD) reactor. Two sets of films were deposited: in the first set the CF₄ flux was varied in the range (from 0 up to 71)% of the total gas flux; in the second set the bias voltage (Vb) was changed in the range (from -150 V up to -350) V, with the gas flow ratio fixed at 33%. Film structure was analysed by IR and Raman spectroscopies and film hardness was obtained by micro-indentation measurements. IR spectra indicate the presence of -CFX, C=CHF and C=CF₂ groups in the films. With increasing fluorine content in films a DLC to polymer-like structural transition occurs, as evidenced by a fluorescence background in Raman spectra that appears at high fluorine content. All films consist of amorphous carbon as shown by the D and G peaks in Raman spectra. The ID/IG intensity ratio increases with increasing fluorine content in the film. This trend correlates with the decreasing hardness in highly fluorinated films. The hardness also changes with Vb, showing a symmetrical trend with a maximum at V_b= -250 V. The ID/IG ratio decreases with increasing hardness, showing a minimum at V_b= -250 V, thus being correlated to the hardness trend. (Authors)