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Kubart, T.; Novak, R.; Polcar, T.
12. International conference on thin films (ICTF 12). Book of Abstract2002
12. International conference on thin films (ICTF 12). Book of Abstract2002
AbstractAbstract
[en] This paper resumes results of our study of the temperature dependent parameters of TiN, CoCr, CoCrN and MoS2 coatings. All investigated coatings were sputtered by means of a system of unbalanced magnetrons with pulsed d.c. supply. The most important deposition parameters ( e.g. total and partial pressures of Ar+N2 mixture, sample bias) were registered. The coatings thickness, determined by means of Calotest method, was 2 - 3 μm. The adhesion was measured with a scratch tester, for coating structure and internal stress evaluation the XRD and for coatings hardness the Hanemann microhardness were used. The temperature dependence of tribological parameters was determined by means of a high temperature tribometer (Authors)
Primary Subject
Source
Majkova, E. (ed.); Stefan Luby, S. (ed.) (Slovak Academy of Sciences, Bratislava (Slovakia)); Slovak Vacuum Society, Bratislava (Slovakia); Slovak Academy of Sciences, Bratislava (Slovakia); Slovak University of Technology, Bratislava (Slovakia); Czech Vacuum Society, Prague (Czech Republic); 182 p; Sep 2002; 1 p; 12. International conference on thin films; Bratislava (Slovakia); 15-20 Sep 2002; Also available from VEDA, Publishing House of Slovak Academy of Sciences, Bratislava, Slovak Republic; p. TF5.5.P
Record Type
Miscellaneous
Literature Type
Conference; Numerical Data
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Country of publication
CHEMICAL VAPOR DEPOSITION, CHROMIUM NITRIDES, COBALT, CRYSTALLOGRAPHY, EXPERIMENTAL DATA, HARDNESS, INHOMOGENEOUS FIELDS, MAGNETRONS, MICROSTRUCTURE, MOLYBDENUM SULFIDES, NANOSTRUCTURES, NITROGEN IONS, SOLIDS, SPUTTERING, THIN FILMS, TITANIUM NITRIDES, TRIBOLOGY, VAPOR DEPOSITED COATINGS, X-RAY DIFFRACTION
CHALCOGENIDES, CHARGED PARTICLES, CHEMICAL COATING, CHROMIUM COMPOUNDS, COATINGS, COHERENT SCATTERING, DATA, DEPOSITION, DIFFRACTION, ELECTRON TUBES, ELECTRONIC EQUIPMENT, ELEMENTS, EQUIPMENT, FILMS, INFORMATION, IONS, MECHANICAL PROPERTIES, METALS, MICROWAVE EQUIPMENT, MICROWAVE TUBES, MOLYBDENUM COMPOUNDS, NITRIDES, NITROGEN COMPOUNDS, NUMERICAL DATA, PNICTIDES, REFRACTORY METAL COMPOUNDS, SCATTERING, SULFIDES, SULFUR COMPOUNDS, SURFACE COATING, TITANIUM COMPOUNDS, TRANSITION ELEMENT COMPOUNDS, TRANSITION ELEMENTS
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