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Gracin, D.; Dubcek, P.; Jaksic, M.
12. International conference on thin films (ICTF 12). Book of Abstract2002
12. International conference on thin films (ICTF 12). Book of Abstract2002
AbstractAbstract
[en] Nonstoichiometric hydrogenated amorphous silicon thin films were deposited by magnetron sputtering in a wide range of hydrogen and carbon concentrations and analyzed by vibrational spectroscopy and GISAXS (Grazing Incidence Small Angle X-ray Scattering). Also, the film composition and density were estimated by IBA (Ion Beam Analysis), e.g. RBS (Rutherford Backscattering Spectrometry) and ERDA (Elastic Recoil Detection Analysis). It was found that the film density decreases with increasing carbon and hydrogen concentration. (Authors)
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Majkova, E. (ed.); Stefan Luby, S. (ed.) (Slovak Academy of Sciences, Bratislava (Slovakia)); Slovak Vacuum Society, Bratislava (Slovakia); Slovak Academy of Sciences, Bratislava (Slovakia); Slovak University of Technology, Bratislava (Slovakia); Czech Vacuum Society, Prague (Czech Republic); 182 p; Sep 2002; 1 p; 12. International conference on thin films; Bratislava (Slovakia); 15-20 Sep 2002; Also available from VEDA, Publishing House of Slovak Academy of Sciences, Bratislava, Slovak Republic; p. TF6.1.O
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Miscellaneous
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Conference; Numerical Data
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AMORPHOUS STATE, CHEMICAL VAPOR DEPOSITION, EXPERIMENTAL DATA, INHOMOGENEOUS PLASMA, ION BEAMS, MAGNETRONS, NANOSTRUCTURES, PLASMA ARC SPRAYING, RUTHERFORD BACKSCATTERING SPECTROSCOPY, SEMICONDUCTOR MATERIALS, SILICON, SILICON CARBIDES, SOLIDS, SPUTTERING, STRUCTURAL CHEMICAL ANALYSIS, SYNCHROTRON RADIATION, SYNCHROTRON RADIATION SOURCES, THIN FILMS, VAPOR DEPOSITED COATINGS, X-RAY DIFFRACTION, X-RAY SOURCES
BEAMS, BREMSSTRAHLUNG, CARBIDES, CARBON COMPOUNDS, CHEMICAL COATING, COATINGS, COHERENT SCATTERING, DATA, DEPOSITION, DIFFRACTION, ELECTROMAGNETIC RADIATION, ELECTRON TUBES, ELECTRONIC EQUIPMENT, ELEMENTS, EQUIPMENT, FILMS, INFORMATION, MATERIALS, MICROWAVE EQUIPMENT, MICROWAVE TUBES, NUMERICAL DATA, PLASMA, RADIATION SOURCES, RADIATIONS, SCATTERING, SEMIMETALS, SILICON COMPOUNDS, SPECTROSCOPY, SPRAY COATING, SURFACE COATING
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