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[en] High-dose implantation (up to (1-5)·1017 cm-2) of tantalum ions into a copper single crystal of (100), (110) and (111) orientation has been investigated. Modified properties just after ion implantation and subsequent age-hardening during ten years were studied. It was shown that ion implantation and subsequent masstransfer process results in sufficient long-term stable changes of the microhardness. (authors)
Source
Anishchik, V.M. (ed.) (Belarusian state univ., Minsk (Belarus)); Belorusskij gosudarstvennyj universitet, Minsk (Belarus); Natsional'naya akademiya nauk Belarusi, Minsk (Belarus); Ministerstvo obrazovaniya Respubliki Belarus', Minsk (Belarus); Gosudarstvennyj komitet po nauke i tekhnologiyam, Minsk (Belarus); Belorusskij innovatsionnyj fond, Minsk (Belarus); Belorusskij respublikanskij fond fundamental'nykh issledovanij, Minsk (Belarus); Belorusskoe fizicheskoe obshchestvo, Minsk (Belarus); 412 p; ISBN 978-985-476-530-3; 
; Sep 2007; p. 171-173; 7. International conference 'Interaction of radiation with solids'; 7. Mezhdunarodnaya konferentsiya 'Vzaimodejstvie izluchenij s tverdym telom'; Minsk (Belarus); 26-28 Sep 2007; 4 refs., 1 tab., 1 fig.
; Sep 2007; p. 171-173; 7. International conference 'Interaction of radiation with solids'; 7. Mezhdunarodnaya konferentsiya 'Vzaimodejstvie izluchenij s tverdym telom'; Minsk (Belarus); 26-28 Sep 2007; 4 refs., 1 tab., 1 fig.