[en] The special features of photoluminescence spectra of silicon-on-insulator structures implanted with hydrogen ions are studied. An increase in the photoluminescence intensity with increasing hydrostatic pressure P during annealing and the formation of narrow periodic photoluminescence peaks in the spectral range from ∼500 to 700 nm are revealed for the structures annealed at P > 6 kbar. It is shown that the fine structure of the photoluminescence spectra correlates with the slowing-down of hydrogen effusion from the implanted samples and with the suppression of the formation of hydrogen microbubbles in the surface layer. These processes promote the formation of an optical resonator, with the mirrors formed by the 'silicon-on-insulator-air' and 'silicon-on-insulator-SiO₂' interfaces and with the optically active layer formed by hydrogen ion implantation and subsequent annealing