[en] The influence of the substrate temperature T_sub (20-360 deg. C) and the oxygen pressure P(O₂) (5 x 10^-3-0.13 Pa) in an evaporation chamber on the structure and phase composition of films prepared through laser sputtering of a vanadium target is investigated by electron diffraction and in situ transmission electron microscopy (with the use of the bend extinction contour technique for determining the bending of the crystal lattice). It is demonstrated that the oxygen content in the films increases with an increase in the oxygen pressure P(O₂) at a fixed substrate temperature T_sub and decreases with an increase in the substrate temperature T_sub at a fixed oxygen pressure P(O₂). The conditions responsible for the formation and composition of the crystalline (VO_0.9) and amorphous (V₂O₃) phases in the films are determined. It is established that the phase composition of the film depends on the angle of condensation of the vapor-plasma flow. The crystallization of the V₂O₃ amorphous phase is accompanied by an increase in the density by 9.2%. It is revealed that the V₂O₃ spherulites growing in the amorphous film have a bent crystal lattice. The bending of the crystal lattice can be as large as ∼42 deg/μm