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AbstractAbstract
[en] Zinc oxide (ZnO) nano thin films have been deposited by the chemical double-dip technique using aqueous ZnSO4 and NaOH solutions. The ZnO films were characterized in terms of surface morphology by x-ray diffraction, energy-dispersive x-ray analysis (EDX), the use of a scanning electron microscope (SEM) and atomic force microscope (AFM) for surface morphology. The films exhibited a smooth morphology. The chemical states of oxygen and zinc in the ZnO nano thin films were also investigated by x-ray photoelectron spectroscopy (XPS). In the present investigations, highly textured ZnO thin films with a preferential (002)-orientation were prepared on glass substrates. The deposition conditions were optimized to obtain device-quality films for practical applications
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Source
Available from http://dx.doi.org/10.1088/1468-6996/9/3/035007; Country of input: International Atomic Energy Agency (IAEA)
Record Type
Journal Article
Journal
Science and Technology of Advanced Materials; ISSN 1468-6996;
; v. 9(3); [5 p.]

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