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Iida, Yusuke; Venkatachalam, S.; Kaneko, Yoshikazu; Kanno, Yoshinori, E-mail: kanno@yamanashi.ac.jp2007
AbstractAbstract
[en] V-W-Nd mixed-oxide films were prepared by pulse-laser deposition (PLD) technique from the targets sintered at different temperatures. X-ray photoelectron spectroscopy (XPS) data indicate that the films fabricated from the targets sintered at low temperature were composed of various mixed valences. Raman spectroscopy shows that V-W-Nd films were composed of the vanadates as NdVO4, and the W6+ doping supplements the formation of vanadate. Atomic force microscopy (AFM) image of the films fabricated from the target sintered at 923 K reveals the average particle size is estimated around 86 nm. The surface morphology of the films roughness shows a dramatic change at 923-943 K
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S0169-4332(07)00801-X; Available from http://dx.doi.org/10.1016/j.apsusc.2007.06.015; Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA)
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Journal Article
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CHALCOGENIDES, CHARGED PARTICLES, DEPOSITION, ELECTROMAGNETIC RADIATION, ELECTRON SPECTROSCOPY, FILMS, IONS, IRRADIATION, LASER SPECTROSCOPY, MICROSCOPY, NEODYMIUM COMPOUNDS, OXIDES, OXYGEN COMPOUNDS, PHOTOELECTRON SPECTROSCOPY, RADIATIONS, RARE EARTH COMPOUNDS, REFRACTORY METAL COMPOUNDS, SIZE, SPECTROSCOPY, SURFACE COATING, TEMPERATURE RANGE, TRANSITION ELEMENT COMPOUNDS, TUNGSTEN COMPOUNDS, VANADIUM COMPOUNDS
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