[en] Nd-doped ceria (NDC) thin film have been deposited on Si(100) substrate at temperature of 400^oC using pulsed-laser ablation deposition technique (PLAD) in vacuum condition and at O₂ pressure between 15 - 29 m Torr. X-ray diffraction, scanning electron microscope (SEM), and energy dispersive x-ray (EDX) analysis have been used to observed structures, thicknesses, and chemical compositions of the films. It was shown that O₂ pressure during the deposition process affected crystallization, thickness, and atomic composition of the films. The obtained NDC thin film with compact structure and various compositions have proved that the PLAD technique has potency in making electrolyte thin films, which is important to solid oxide fuel cell (SOFC). (author)