[en] The structure, phase state and electrical resistivity nanocrystalline Cr_1-xAl_x-N and Cr_1-x-V_x-N coatings were investigated. These coatings were obtained by means simultaneously metal vapor deposition and high energy nitrogen ion bombardment (IBAD method). It was proved that for both type coatings took place the formation of nanocrystalline fcc structures. They are the Cr_1-x-Al_x-N and Cr_1-x-V_x-N films consists of solid solution between CrN and VN or AlN. When increasing aluminum content in CrN took place the lattice parameters of Cr_1-x-Al_x-N were decreased from 0,416 (x = 0) to 0,409 nm (x = 0,6). The lattice parameters Cr_1-x-V_x-N films was not changed (∼0,416 nm). The temperature coefficients of the resistivity (TCR) change sign from positive to negative for both type of coatings when aluminum or vanadium content were increased