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AbstractAbstract
[en] There is no polymeric detector used to register the beam profile of UV lasers. Here, a method is proposed for the measurement of intensive UV beam pattern of the excimer lasers based on the photoablated polycarbonate detector after coherent UV exposure and the subsequent electrochemical etching. UV laser induced defects in the form of self-microstructuring on polycarbonate are developed to replicate the spatial intensity distribution as a beam profiler
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23. international conference on nuclear tracks in solids; Beijing (China); 11-15 Sep 2006; S1350-4487(08)00152-2; Available from http://dx.doi.org/10.1016/j.radmeas.2008.03.046; Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA)
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Journal Article
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Conference
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