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Ahn, Donggi; Kim, Chunjoong; Lee, Joon-Gon; Park, Byungwoo, E-mail: byungwoo@snu.ac.kr2008
AbstractAbstract
[en] The effects of nitrogen on the electrochemical properties of silicon-nitrogen (Si1-xNx) thin films were examined in terms of their initial capacities and cycling properties. In particular, Si0.76N0.24 thin films showed negligible initial capacity but an abrupt capacity increase to ∼2300 mA h/g after ∼650 cycles. The capacity of pure Si thin films was deteriorated to ∼20% of the initial level after 200 cycles between 0.02 and 1.2 V at 0.5 C (1 C=4200 mA/g), whereas the Si0.76N0.24 thin films exhibited excellent cycle-life performance after ∼650 cycles. In addition, the Si0.76N0.24 thin films at 50 deg. C showed an abrupt capacity increase at an earlier stage of only ∼30 cycles. The abnormal electrochemical behaviors in the Si0.76N0.24 thin films were demonstrated to be correlated with the formation of Li3N and Si3N4. - Graphical abstract: The Si0.76N0.24 thin films showed negligible initial capacity, but an abrupt capacity increase to ∼2300 mA h/g after ∼650 cycles, followed by excellent cycle-life performance. This abnormal electrochemical behavior was demonstrated to be correlated with the formation of Li3N and Si3N4
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S0022-4596(08)00224-7; Available from http://dx.doi.org/10.1016/j.jssc.2008.04.040; Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA)
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