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Molle, A; Wiemer, C; Bhuiyan, M D N K; Tallarida, G; Fanciulli, M, E-mail: alessandro.molle@mdm.infm.it2008
AbstractAbstract
[en] Gd2O3 thin films were grown on Ge (001) substrates by molecular beam epitaxy. The epitaxial character of the film is demonstrated by electron diffraction during the growth. The structural characterization of the films shows that the Gd2O3 forms a bixbyite polymorph with a (110) out-of-plane orientation. The formation of bixbyite structured Gd2O3 is discussed in terms of the atomic arrangement of the oxide planes on the Ge(001) surface
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Source
IVC-17: 17. international vacuum congress; Stockholm (Sweden); 2-6 Jul 2007; ICSS-13: 13. international conference on surface science; Stockholm (Sweden); 2-6 Jul 2007; ICN+T 2007: International conference on nanoscience and technology; Stockholm (Sweden); 2-6 Jul 2007; Available from http://dx.doi.org/10.1088/1742-6596/100/4/042048; Country of input: International Atomic Energy Agency (IAEA)
Record Type
Journal Article
Literature Type
Conference
Journal
Journal of Physics. Conference Series (Online); ISSN 1742-6596;
; v. 100(4); [4 p.]

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