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AbstractAbstract
[en] Measurements of positive ion flux to a negatively biased substrate for deposition of TiOx thin films by the hollow cathode plasma jet system are presented. Different methods of obtaining the bias of substrate and measuring the resulting ion flux were used for different bias frequencies. Pulsed DC bias, middle frequency 500 kHz bias, and 13.56 MHz RF bias were compared. For 13.56 MHz two different methods of ion flux determination were used. These measurements were performed for different bias voltage and discharge conditions
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PLASMA 2007: International conference on research and applications of plasmas; Greifswald (Germany); 16-19 Oct 2007; 4. German-Polish conference on plasma diagnostics for fusion and applications; Greifswald (Germany); 16-19 Oct 2007; 6. French-Polish seminar on thermal plasma in space and laboratory; Greifswald (Germany); 16-19 Oct 2007; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
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Journal Article
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Conference
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