Filters
Results 1 - 1 of 1
Results 1 - 1 of 1.
Search took: 0.016 seconds
Singh, D.R.P.; Deng, X.; Chawla, N.; Bai, J.; Hubbard, Camden R.; Tang, G.; Shen, Y.-L.
Oak Ridge National Laboratory (United States); High Flux Isotope Reactor (United States); High Temperature Materials Laboratory (United States). Funding organisation: EE USDOE - Office of Energy Efficiency and Renewable Energy (United States)2010
Oak Ridge National Laboratory (United States); High Flux Isotope Reactor (United States); High Temperature Materials Laboratory (United States). Funding organisation: EE USDOE - Office of Energy Efficiency and Renewable Energy (United States)2010
AbstractAbstract
[en] Nanolayered composites are used in a variety of applications such as wear resistant coatings, thermal barrier coatings, optical and magnetic thin films, and biological coatings. Residual stresses produced in these materials during processing play an important role in controlling their microstructure and properties. In this paper, we have studied the residual stresses in model metal-ceramic Al/SiC nanoscale multilayers produced by physical vapor deposition (magnetron sputtering). X-ray synchrotron radiation was used to measure stresses in the multilayers using the sin2 Ψ technique. The stresses were evaluated as a function of layer thicknesses of Al and SiC and also as a function of the number of layers. The stress state of Al in the multilayer was largely compressive, compared to single layer Al stresses. This is attributed to a peening mechanism due to bombardment of the Al layers by SiC and Ar neutrals during deposition. The stress evolution was numerically modeled by a simplified peening process to qualitatively explain the Al thickness-dependent residual stresses.
Primary Subject
Source
VT0503000; CEVT005; AC05-00OR22725
Record Type
Journal Article
Journal
Country of publication
Reference NumberReference Number
INIS VolumeINIS Volume
INIS IssueINIS Issue