[en] Studies of organic coolants in the out-reactor 250-0-1 loop and in the in-reactor X-7 loop have shown that fouling films are deposited on heat-transfer surfaces by two mechanisms, one involving soluble impurities and the other insoluble impurities in the coolant. The simultaneous action of two mechanisms of deposition can lead to a wide variety of compositions and structures of the deposited film. The concentration of impurities is the most important factor controlling the deposition rate. Coolant velocity and surface temperature also have major effects on the fouling rate. At low chlorine levels continuous coolant cleanup through Attapulgus clay has been shown to reduce deposition rates under representative reactor conditions from 100 μg/cm² hr to 1 μg/cm² hr. Chlorine, which is a strong promoter of fouling, is not removed by Attapulgus clay. Further studies of its important effect on fouling and its removal will be the subjects of separate reports. An acceptable deposition rate of 0.3 μg/cm² hr should be achieved by intensive purification, coupled with the exclusion of impurities such as chlorine. (author)