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[en] It has been fabricated and characterization a TiO2 thin films deposited on glass substrate using DC sputtering technique. Fabrication of TiO2 thin films were carried out at electrode voltage 4 kV, sputtering current 5 mA, vacuum pressure 5 x 10-4 torr, deposition time 150 minutes, and temperature of the substrate were varied from 150 -350 oC, while as a gas sputter was argon. The results was tested their micro structure using SEM, and crystal structure using XRD and found that the crystal structure of TiO2 powder before deposited on glass substrate was rutile and anatase with orientation (110) and (200) for anatase and (100) and (111) rutile structure. While the crystal structure which deposited at temperature 150 oC and deposition time 2.5 hours was anatase with orientation (001) and (200). (author)
Source
Sukarsono, R.; Ganang Suradjijo (National Nuclear Energy Agency, Yogyakarta (Indonesia)) (eds.); Centre for Research and Development of Advanced Technology, National Nuclear Energy Agency, Yogyakarta (Indonesia); 265 p; ISSN 0216-3128; 
; 2002; p. 116-123; Scientific Meeting and Presentation on Basic Research in Nuclear Science and Technology; Pertemuan dan Presentasi Ilmiah Penelitian Dasar Ilmu Pengetahuan dan Teknologi Nuklir; Yogyakarta (Indonesia); 27 Jun 2002; Also available from Center for Development of Nuclear Informatics, National Nuclear Energy Agency, Puspiptek Area, Fax. 62-21-7560923, PO BOX 4274, Jakarta (ID); 13 refs.; 6 figs.
; 2002; p. 116-123; Scientific Meeting and Presentation on Basic Research in Nuclear Science and Technology; Pertemuan dan Presentasi Ilmiah Penelitian Dasar Ilmu Pengetahuan dan Teknologi Nuklir; Yogyakarta (Indonesia); 27 Jun 2002; Also available from Center for Development of Nuclear Informatics, National Nuclear Energy Agency, Puspiptek Area, Fax. 62-21-7560923, PO BOX 4274, Jakarta (ID); 13 refs.; 6 figs.