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Mandal, A.; Adhi, S.K.; Shinde, S.D.; Adhi, K.P., E-mail: ska@disc.unipune.ac.in
Proceedings of the DAE-BRNS seventh national symposium on pulsed laser deposition of thin films and nanostructured materials2013
Proceedings of the DAE-BRNS seventh national symposium on pulsed laser deposition of thin films and nanostructured materials2013
AbstractAbstract
[en] A study on the effect of ambient oxygen pressure maintained during deposition and its variation on the structural, electrical and optical properties of Eu doped ZnO thin film is presented. The films were grown by the pulsed laser deposition technique wherein the 4th harmonic of Nd:YAG laser at 266 nm (pulse duration tp = 7 nsec) was used. 1% Eu doped ZnO target (Zn0.99Eu0.01O) was synthesized by the standard solid state ceramic route using high purity ZnO and Eu2O3 powders taken in their stoichiometric proportions. The X-ray diffraction (XRD) studies of the synthesized pellet revealed the formation of single phase, polycrystalline Zn0.99Eu0.01O. This pellet was ablated in the deposition chamber to deposit the thin films. The films were deposited on SiOx/Si(100) substrates under different oxygen pressure conditions viz. 10-6 (vacuum), 10-5, 10-4 and 10-3 Torr. X-ray diffraction studies reveal the growth of highly c-axis oriented, single phase Zn0.99Eu0.01O thin films on SiOx/Si(100) substrate. The in-plane stress of the Zn0.99Eu0.01O films was observed to be extensive which increased with the increase in oxygen pressure. With the increase in oxygen pressure the crystalline quality of Zn0.99Eu0.01O showed slight improvement. The average roughness of the films was observed to reduce with the increase in ambient oxygen pressure. Eu doped ZnO thin films deposited in vacuum showed low resistive, however it was observed to increase with the increase in oxygen pressure. The charge carrier concentration was commensurately observed to reduce with the increase in oxygen pressure. The photoluminescence spectra showed significant variation in the intensity of the band edge emission of ZnO and also the 5D0 → 7F2 transition at 612 nm corresponding to Eu3+ ions. It was seen that the intensities of the band edge emission and that of the 5D0 → 7F2 transition in case of thin films deposited at 1 x 10-5 Torr was much higher than that of other samples. Attempt is made to explicate these observations in correlation with the oxygen ambient pressure. (author)
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Raja Ramanna Centre for Advanced Technology, Indore (India); Department of Physics and Meteorology, Indian Institute of Technology Kharagpur, Kharagpur (India); 132 p; 2013; p. 107; PLD-2013: 7. DAE-BRNS national symposium on pulsed laser deposition of thin films and nanostructured materials; Kharagpur (India); 14-16 Nov 2013
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