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Miyajima, T.; Chen, S.; Furuya, T.; Haga, K.; Hanyu, I.; Harada, K.; Honda, T.; Honda, Y.; Kako, E.; Kamiya, Y.; Kato, R.; Kawata, H.; Kobayashi, Y.; Konomi, T.; Kubo, T.; Michizono, S.; Nakai, H.; Nakamura, N.; Obina, T.; Oide, K.; Sakai, H.; Sakanaka, S.; Shimada, M.; Tsuchiya, K.; Umemori, K.; Yamamoto, M.; Hajima, Ryoichi; Nishimori, Nobuyuki, E-mail: tsukasa@post.kek.jp
Proceedings of the 12th annual meeting of Particle Accelerator Society of Japan2015
Proceedings of the 12th annual meeting of Particle Accelerator Society of Japan2015
AbstractAbstract
[en] An free electron laser (FEL) light source based on energy recovery linac (ERL) to generate intense extreme UV (EUV) light has been designed as a future light source for EUV lithography. The light source has been designed based on the operation results of the compact ERL (cERL), which is a test accelerator to demonstrate the performance of ERL. The requirements for the EUV-FEL light source are the wave length of 13.5 nm, and the FEL power of more than 10 kW. In order to estimate the light source performance, simulations about the injector, the bunch compression and decompression, and the FEL generation were carried out. These results show that the performance of the EUV-FEL light source based on ERL can satisfy the target performance of the future EUV lithography. (author)
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Particle Accelerator Society of Japan, Tokyo (Japan); 1419 p; Aug 2015; p. 247-250; 12. annual meeting of Particle Accelerator Society of Japan; Tsuruga, Fukui (Japan); 5-7 Aug 2015; Available from Particle Accelerator Society of Japan, 2-62-8-507 Higashi-Ikebukuro, Toshima-ku, Tokyo, 170-0013 Japan; Also available from the Internet at URL http://www.pasj.jp/web_publish/pasj2015/proceedings/index.html; 7 refs., 5 figs., 2 tabs.
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