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Vasconcellos, Marcos Antonio Zen; Lima, Saulo Cordeiro; Hinrichs, Ruth
Associacao Brasileira de Metalurgia, Materiais e Mineracao (ABM), Sao Paulo, SP (Brazil)2010
Associacao Brasileira de Metalurgia, Materiais e Mineracao (ABM), Sao Paulo, SP (Brazil)2010
AbstractAbstract
[en] Titanium nitride films were formed on the surface of Ti-6Al-4V discs by plasma nitriding (glow discharge) in different N_2:H_2 atmospheres at several substrate temperatures. In this study the influence of the process parameters on dynamic micro-hardness were investigated. Grain sizes of the nitride films, determined with X Ray Diffraction, were related to the nitriding parameters. TiNx stoichiometry was determined with Nuclear Reaction Analysis and showed a correlation to substrate temperature during the nitriding process. Micro-hardness measurements were taken on the nitrided surfaces. Grain sizes increased for a particular gas composition of 60%N_2+40%H_2 where hardness was lowest. (author)
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2010; 7 p; 65. ABM international congress; Rio de Janeiro, RJ (Brazil); 26-30 Jul 2010; 18. IFHTSE congress: international federation for heat treatment and surface engineering; Rio de Janeiro, RJ (Brazil); 26-30 Jul 2010; 1. TMS/ABM international materials congress 2010; Rio de Janeiro, RJ (Brazil); 26-30 Jul 2010
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