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Tentardini, Eduardo Kirinus; Carvalho, Renata Gomes; Freitas, Flavio Gustavo Ribeiro; Santos, Daniel Felix; Fernandez, Daniel Angel Ramirez; Felix, Lucas Campos; Hubler, Roberto; Hentz, Agenor, E-mail: etentardini@gmail.com
Brazilian Materials Research Society (B-MRS), Rio de Janeiro, RJ (Brazil)2015
Brazilian Materials Research Society (B-MRS), Rio de Janeiro, RJ (Brazil)2015
AbstractAbstract
[en] Full text: Nitride transition metal thin films have been extensively used in the last decades due to properties as hardness, wear resistance and mechanical strength. Zirconium nitride (ZrN) and niobium nitride (NbN) are coatings used in mechanical industries due its excellent tribological properties besides corrosion and oxidation resistance. However, these coating have problems to support oxidation in high temperature, once NbN and ZrN oxidize at 400 deg C and 600 deg C, respectively. A possibility to improve the oxidation resistance of ZrN and NbN is the addition of a third chemical element, as silicon or aluminum, forming ZrSiN and NbAlN. However, few studies were founded to verify the influence of these elements in structural and oxidation resistance of these nitrides. In this work were deposited ZrSiN and NbAlN thin films by reactive magnetron sputtering using a AJA Orion 5-HV Sputtering Systems, modifying the amount of silicon and aluminum in each coating. Coatings were characterized as deposited by RBS, nanohardness, GAXRD and SEM. After oxidation tests in different temperatures coatings were analysed by SEM and XRD to verify changes on coatings structure and morphology properties. (author)
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Source
2015; 1 p; 14. Brazil MRS meeting; Rio de Janeiro, RJ (Brazil); 27 Sep - 1 Oct 2015; Available in abstract form only; full text entered in this record
Record Type
Miscellaneous
Literature Type
Conference
Country of publication
CHEMICAL REACTIONS, COHERENT SCATTERING, DIFFRACTION, ELECTRON MICROSCOPY, ELECTRON TUBES, ELECTRONIC EQUIPMENT, ELEMENTS, EQUIPMENT, FILMS, METALS, MICROSCOPY, MICROWAVE EQUIPMENT, MICROWAVE TUBES, NIOBIUM COMPOUNDS, NITRIDES, NITROGEN COMPOUNDS, PNICTIDES, REFRACTORY METAL COMPOUNDS, SCATTERING, SEMIMETALS, TEMPERATURE RANGE, TRANSITION ELEMENT COMPOUNDS, ZIRCONIUM COMPOUNDS
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