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Heinrich, L; Kobayashi, H; Vollertsen, F; Shimizu, T; Yang, M, E-mail: heinrich@bias.de2017
AbstractAbstract
[en] Nowadays, an increasing demand for small metal parts in electronic and automotive industries can be observed. Deep drawing is a well-suited technology for the production of such parts due to its excellent qualities for mass production. However, the downscaling of the forming process leads to new challenges in tooling and process design, such as high relative deviation of tool geometry or blank displacement compared to the macro scale. FEM simulation has been a widely-used tool to investigate the influence of symmetrical process deviations as for instance a global variance of the drawing radius. This study shows a different approach that allows to determine the impact of asymmetrical process deviations on micro deep drawing. In this particular case the impact of an asymmetrical drawing radius deviation and blank displacement on cup geometry deviation was investigated for different drawing ratios by experiments and FEM simulation. It was found that both variations result in an increasing cup height deviation. Nevertheless, with increasing drawing ratio a constant drawing radius deviation has an increasing impact, while blank displacement results in a decreasing offset of the cups geometry. This is explained by different mechanisms that result in an uneven cup geometry. While blank displacement leads to material surplus on one side of the cup, an unsymmetrical radius deviation on the other hand generates uneven stretching of the cups wall. This is intensified for higher drawing ratios. It can be concluded that the effect of uneven radius geometry proves to be of major importance for the production of accurately shaped micro cups and cannot be compensated by intentional blank displacement. (paper)
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Source
Available from http://dx.doi.org/10.1088/1742-6596/896/1/012060; Country of input: International Atomic Energy Agency (IAEA)
Record Type
Journal Article
Journal
Journal of Physics. Conference Series (Online); ISSN 1742-6596;
; v. 896(1); [8 p.]

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