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AbstractAbstract
[en] The conditions for obtaining epitaxial InN layers on a-plane (11-20) sapphire with a GaN buffer layer by MOCVD method are determined for the first time. Comparative studies show that InN layers on a-plane sapphire have higher structural perfection and improved photoluminescence properties compared to those grown on c-plane sapphire. Formation of indium clusters in the InN layers along with the conditions impeding their appearance is considered. (copyright 2018 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim)
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Source
Available from: http://dx.doi.org/10.1002/pssa.201700919; With 5 figs.
Record Type
Journal Article
Journal
Physica Status Solidi A. Applications and Materials Science (Online); ISSN 1862-6319;
; v. 215(11); p. 1-4

Country of publication
ALUMINIUM COMPOUNDS, CHALCOGENIDES, CHEMICAL ANALYSIS, CHEMICAL COATING, COHERENT SCATTERING, CORUNDUM, CRYSTAL GROWTH METHODS, DEPOSITION, DIFFRACTION, EMISSION, EPITAXY, EVALUATION, FILMS, GALLIUM COMPOUNDS, INDIUM COMPOUNDS, LUMINESCENCE, MICROANALYSIS, MINERALS, NITRIDES, NITROGEN COMPOUNDS, NONDESTRUCTIVE ANALYSIS, ORGANIC COMPOUNDS, OXIDE MINERALS, OXIDES, OXYGEN COMPOUNDS, PHOTON EMISSION, PNICTIDES, SCATTERING, SPECTROSCOPY, SURFACE COATING
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