[en] We study the effect of substrate type, source temperature, and substrate position on the morphology of Alfa molybdenum oxide (α-MoO₃) in physical vapour deposition. We found that the orientation and thickness of the MoO₃ is strongly affected by the evaporated flow and temperature. Lying down, few layered (FL) MoO₃ can be grown directly on technical substrate such as SiO₂ with typical length scale of tens of micrometres. Our studies provide a simple, catalyst-free and low cost synthesis way to prepared large size FL MoO₃ for further optical and electrical investigation such as photodetector, field effect transistors, and electrochromism. (paper)