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[en] Properties of thin-film solid-state facilities (electrical, magnetic, optical, etc.) depend on their chemical composition and thickness. For this reason, the determination of the chemical composition, thickness, and other physical and chemical characteristics of films and coatings for obtaining materials with unique physical properties is an important task of analytical chemistry and condensed matter physics. Among the various physical and chemical methods for determining the chemical composition and other characteristics of films and thin coatings the X-ray fluorescence method of analysis (XRF) shows good results. This report presents the features of the application of X-ray fluorescence analysis to the study of a chemical composition and thickness of films and surface coatings. The cases of X-ray fluorescence analysis of coating surfaces of complex configurations are considered. The option of obtaining information about the chemical composition and thickness of different layers for multilayer structures is discussed in detail.