[en] X-ray diffraction and SEM microscopy were used to study the structural and phase changes in a thin film obtained by magnetron sputtering of a Ti₅₂Zr₃₀Ni₁₈ target (at.%) on a steel substrate under the radiation-thermal influence of pulsed hydrogen plasma on an QSPA Kh-50 accelerator. A technique has been worked out for the formation of the quasicrystalline and crystal-approximant phases as a result of high-speed quenching using pulsed action with a heat load of 0.6 MJ/m2 . The changes in the contents of these phases as well as in their structure and substructure parameters were studied during isothermal vacuum annealing at a temperature of 550 °C and also as a result of irradiation with 5 plasma pulses in the range of heat load from 0.1 to 0.4 MJ/m2 . The quasicrystalline phase was found to be resistant to irradiation with hydrogen plasma. (author)