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Woodward, R I; Murray, R T; Runcorn, T H; Kelleher, E J R; Phelan, C F; Oliveira, R E P de; Oliveira, E C de; Fechine, G J M; Matos, C J S de; Li, S; Eda, G, E-mail: cjsdematos@mackenzie.br2017
AbstractAbstract
[en] We report second- and third-harmonic generation in monolayer MoS2 as a tool for imaging and accurately characterizing the material’s nonlinear optical properties under 1560 nm excitation. Using a surface nonlinear optics treatment, we derive expressions relating experimental measurements to second- and third-order nonlinear sheet susceptibility magnitudes, obtaining values of m2 V−1 and, for the first time for monolayer MoS2, m3 V−2. These sheet susceptibilities correspond to effective bulk nonlinear susceptibility values of m V−1 and m2 V−2, accounting for the sheet thickness. Experimental comparisons between MoS2 and graphene are also performed, demonstrating ∼3.4 times stronger third-order sheet nonlinearity in monolayer MoS2, highlighting the material’s potential for nonlinear photonics in the telecommunications C band. (letter)
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Available from http://dx.doi.org/10.1088/2053-1583/4/1/011006; Country of input: International Atomic Energy Agency (IAEA)
Record Type
Journal Article
Journal
2D Materials; ISSN 2053-1583;
; v. 4(1); [7 p.]

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