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Ikeda, S; Motoki, T; Gondo, S; Shimoyama, J; Nakamura, S; Honda, G; Nagaishi, T; Doi, T, E-mail: motoki@phys.aoyama.ac.jp2019
AbstractAbstract
[en] We improved the critical current properties of fluorine-free metal organic decomposition processed YBCO thin films prepared on buffered metallic substrates by increasing the thickness of the films. YBCO films prepared using a conventional one-time growth exhibit a maximum I c (77 K, ∼0 T) value of ∼100 A per 1 cm width for a film with a thickness of 0.8 μm, and I c decreases with further increases in the film thickness due to the generation of impurity particles and micro-cracks. In this study, a multiple growth process was adopted for the preparation of thick films to avoid these problems. The I c of films prepared using this method monotonically increased with the film thickness. YBCO films with a thickness of ∼3.0 μm recorded a quite high I c (77 K, ∼0 T) value for ∼210 A cm−1 width. Additionally, the in-field J cs at 20 K and 40 K were found to increase almost proportionally to the film thickness. (paper)
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Available from http://dx.doi.org/10.1088/1361-6668/ab3d92; Country of input: International Atomic Energy Agency (IAEA)
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Journal Article
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