[en] Non evaporable getter (NEG) films were deposited inside the Stainless steel (SS) 316L chamber and also on the samples like SS, aluminium and glass via DC magnetron sputtering method using argon gas. NEG films were deposited at 150°C and 250°C substrate temperature keeping other deposition parameters same. Samples have been investigated by Scanning electron microscopy (SEM)/ AFM, Energy dispersive X-ray spectroscopy (EDX), Mechanical stylus profilometer to determine film structure, composition and thickness respectively. Films deposited on different substrate materials have different microstructures. The microstructure of the film was comparatively more dense and smooth at higher substrate temperature. The rough surface has a large capability to absorb oxygen than the dense and smooth Ti-Zr-V films. Thus comparatively higher pumping speed was achieved for the chamber coated at 150°C. Vacuum performances like ultimate vacuum and pumping speed of the NEG coated cylindrical SS chambers deposited at different substrate temperatures are also presented in this paper. The best pumping speed achieved for CO gas was 1.85 l.s^-1.cm^-2. (author)