[en] This paper describes the addition of secondary-ion mass-analysis capabilities to a commercially available ion-scattering spectrometer. Particular attention has been paid to optimizing both signals in simultaneous operation. Primary-ion beam profiles and contributions from the sample holder to the secondary-ion signals have been examined. The combined technique has been found to work well for insulators, semiconductors, and conductors. The results of surface analyses for fluorocarbon and organosilicon coatings on quartz are given. Molecular species indicative of chemical bonds at the interface between the coating and the substrate were found with secondary ions. Both ion-scattering and secondary-ion mass analysis agree in tracking the approach to steady state with sputtering time. The system was also applied to the study of sodium profiles in glass. In this case, the variation of sodium concentration could not be followed as a function of depth by ion scattering but was easily detected with secondary ions. (Auth.)